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Proceedings Paper

Computer simulation of diffusion processes in microelectronics: approach to the solution of statistical problems
Author(s): Vladislav V. Nelayev; Maxim V. Kazitov; Sergey I. Vatlin; Aljvina M. Voronkovskaya; Antonina M. Semenkova
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Paper Abstract

Many-dimensional technology simulation in microelectronics is the extremely actual problem. Here it is important to know how random fluctuations of the technological parameters affect on the impurity concentration profiles. We used the pattern recognition method as one of the effective tool for the solution of this problem. Expert analysis system as an effective tool for numerical calculation database processing is discussed.

Paper Details

Date Published: 5 May 1999
PDF: 5 pages
Proc. SPIE 3687, International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, (5 May 1999); doi: 10.1117/12.347449
Show Author Affiliations
Vladislav V. Nelayev, Belorussian State Univ. of Informatics and Radioelectronics (Belarus)
Maxim V. Kazitov, Belorussian State Univ. of Informatics and Radioelectronics (Belarus)
Sergey I. Vatlin, Belorussian Ctr. of Medical Radiation Technology (Belarus)
Aljvina M. Voronkovskaya, Belorussian Ctr. of Medical Radiation Technology (Belarus)
Antonina M. Semenkova, Belorussian Ctr. of Medical Radiation Technology (Belarus)


Published in SPIE Proceedings Vol. 3687:
International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering
Alexander I. Melker, Editor(s)

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