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Proceedings Paper

Theoretical and practical aspects of remote temperature measurement in semiconductor manufacturing
Author(s): Evgeny Glazman; A. Glazman; Assaf Thon
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Paper Abstract

The general principles of operation of passive and active pyrometry methods are considered. The usefulness of ratio, multi-ratio, approximation, and enhanced emissivity methods to unknown and changing emissivity situations is analyzed. A spectral functional for the emissivity is postulated to give the theoretical limit of accuracy of any passive method. A novel passive-active method, with accuracy better than 1 percent, for semiconductor wafer measurement is described and demonstrated through on-line measurement in Rapid Thermal Chemical Vapor Deposition process.

Paper Details

Date Published: 27 April 1999
PDF: 9 pages
Proc. SPIE 3743, In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing, (27 April 1999); doi: 10.1117/12.346914
Show Author Affiliations
Evgeny Glazman, True Temperature Technologies (Israel)
A. Glazman, True Temperature Technologies (Israel)
Assaf Thon, True Temperature Technologies (Israel)


Published in SPIE Proceedings Vol. 3743:
In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing
Kostas Amberiadis; Gudrun Kissinger; Katsuya Okumura; Seshu Pabbisetty; Larg H. Weiland, Editor(s)

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