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Proceedings Paper

Challenge of extending optical lithography
Author(s): Keith A. Chivers
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Paper Abstract

For many generations of integrated circuit technology optical lithography has been used for patterning. Given this dominance the possible limits of optical lithography are examined and the challenges towards reaching these limits are set out. The present and near future technologies are investigated in detail and the more long term technologies are looked into and finally a possible optical lithography exposure system roadmap is constructed.

Paper Details

Date Published: 28 April 1999
PDF: 11 pages
Proc. SPIE 3741, Lithography for Semiconductor Manufacturing, (28 April 1999); doi: 10.1117/12.346899
Show Author Affiliations
Keith A. Chivers, Nikon Precision Europe GmbH (Netherlands)


Published in SPIE Proceedings Vol. 3741:
Lithography for Semiconductor Manufacturing
Chris A. Mack; Tom Stevenson, Editor(s)

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