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Proceedings Paper

Submicron structure image formation by one-pulse intracavity laser processing
Author(s): Vasily V. Valyavko; Vladimir P. Osipov
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Paper Abstract

There are shown the basic experimental result, achieved by the 1.06-micrometer intracavity laser processing of the 800 angstrom aluminum film evaporated on the optical glass substrate. There is described the nw laser cavity geometry, which allows to form 2D submicron-size image on the solid- state surface by means of one pulse of laser radiation.

Paper Details

Date Published: 28 April 1999
PDF: 6 pages
Proc. SPIE 3741, Lithography for Semiconductor Manufacturing, (28 April 1999); doi: 10.1117/12.346890
Show Author Affiliations
Vasily V. Valyavko, Institute of Physics (Belarus)
Vladimir P. Osipov, Institute of Physics (Belarus)

Published in SPIE Proceedings Vol. 3741:
Lithography for Semiconductor Manufacturing
Chris A. Mack; Tom Stevenson, Editor(s)

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