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Proceedings Paper

Simulation of optical lithography
Author(s): Andreas Erdmann; Wolfgang Henke
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Paper Abstract

Simulation of photolithographic processes is widely used in semiconductor research and industry. The paper reviews physical models and capabilities of modern lithography simulators. Application of these simulation techniques to the manufacturing of microelectronic, optical and micro- optical components are discussed.

Paper Details

Date Published: 29 April 1999
PDF: 15 pages
Proc. SPIE 3729, Selected Papers from International Conference on Optics and Optoelectronics '98, (29 April 1999); doi: 10.1117/12.346826
Show Author Affiliations
Andreas Erdmann, Fraunhofer Institute for Silicon Technology (Germany)
Wolfgang Henke, Fraunhofer Institute for Silicon Technology (Germany)


Published in SPIE Proceedings Vol. 3729:
Selected Papers from International Conference on Optics and Optoelectronics '98
Kehar Singh; Om Prakash Nijhawan; Arun Kumar Gupta; A. K. Musla, Editor(s)

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