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Proceedings Paper

Simulation and optimization of holographically exposed photoresist gratings
Author(s): Ch. Zanke; Andreas Gombert; Andreas Erdmann; M. Weiss
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Paper Abstract

Standard approaches of lithographic process simulation have been applied to the simulation of holographically exposed photoresist gratings. Fine tuning of the photoresist development parameters results in a good agreement of simulated and experimentally obtained photoresist profiles. Several conclusions with respect to the optimization of process and photoresist parameters for the fabrication of user defined photoresist profiles are drawn.

Paper Details

Date Published: 29 April 1999
PDF: 6 pages
Proc. SPIE 3729, Selected Papers from International Conference on Optics and Optoelectronics '98, (29 April 1999); doi: 10.1117/12.346788
Show Author Affiliations
Ch. Zanke, Fraunhofer Institute for Solar Energy Systems (Germany)
Andreas Gombert, Fraunhofer Institute for Solar Energy Systems (Germany)
Andreas Erdmann, Fraunhofer Institute for Silicon Technology (Germany)
M. Weiss, Fraunhofer Institute for Silicon Technology (Germany)


Published in SPIE Proceedings Vol. 3729:
Selected Papers from International Conference on Optics and Optoelectronics '98
Kehar Singh; Om Prakash Nijhawan; Arun Kumar Gupta; A. K. Musla, Editor(s)

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