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Proceedings Paper

Initial results from a Leica ZBA31H+ shaped E-beam mask writer located at the Photronics Advanced Mask Shop in Manchester, England
Author(s): Stephen Johnson; Paul Marshall; Peter Osborne; Hans-Joachim Doering; Christian Ehrlich
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Paper Abstract

Since production started at the Photronics site in Manchester, England, mask writing capability had been centered on laser based technology. The Manchester site has now taken delivery of its first e-beam system: the ZBA 31H+, manufactured by Leica Microsystems Lithography GMBH. The ZBA 31H+) system was designed for the production of reticles utilizing 250 nanometer design technology and is expected to play a key role in Photronics' future reticle development. The addition of an e-beam system to the current laser based technology, in this instance, has been driven by increasing customer demand and the requirement for reticles containing high resolution OPC structures. The ZBA 31H+) is a variable shaped spot, vector scan electron beam lithography system operating at 20 keV. Enhancements from the previous generation system include improved deflection systems, stage metrology, pattern data handling, and an address grid down to 10 nanometers. This system's specified performance enablers it to produce reticles designed to support semiconductor fabrication utilizing 250 nanometer design rules, and beyond, with high accuracy and productivity.

Paper Details

Date Published: 23 April 1999
PDF: 6 pages
Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); doi: 10.1117/12.346229
Show Author Affiliations
Stephen Johnson, Photronics, Ltd. (United Kingdom)
Paul Marshall, Photronics, Ltd. (United Kingdom)
Peter Osborne, Photronics, Ltd. (United Kingdom)
Hans-Joachim Doering, Leica Microsystems Lithography GmbH (Germany)
Christian Ehrlich, Leica Microsystems Lithography GmbH (Germany)

Published in SPIE Proceedings Vol. 3665:
15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98
Uwe F. W. Behringer, Editor(s)

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