Share Email Print
cover

Proceedings Paper

Overview of SCALPEL mask technology
Author(s): Gregory R. Bogart; Anthony E. Novembre; Avi Kornblit; Milton L. Peabody; Reginald C. Farrow; Myrtle I. Blakey; Richard J. Kasica; James Alexander Liddle; Thomas E. Saunders; Chester S. Knurek
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Scattering with angular limitation projection electron beam lithography is a true 4X reduction technology that capitalizes on high resolution capabilities from electron beam exposure and high throughput capability from projection.

Paper Details

Date Published: 23 April 1999
PDF: 2 pages
Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); doi: 10.1117/12.346223
Show Author Affiliations
Gregory R. Bogart, Lucent Technologies/Bell Labs. (United States)
Anthony E. Novembre, Lucent Technologies/Bell Labs. (United States)
Avi Kornblit, Lucent Technologies/Bell Labs. (United States)
Milton L. Peabody, Lucent Technologies/Bell Labs. (United States)
Reginald C. Farrow, Lucent Technologies/Bell Labs. (United States)
Myrtle I. Blakey, Lucent Technologies/Bell Labs. (United States)
Richard J. Kasica, Lucent Technologies/Bell Labs. (United States)
James Alexander Liddle, Lucent Technologies/Bell Labs. (United States)
Thomas E. Saunders, Lucent Technologies/Bell Labs. (United States)
Chester S. Knurek, Lucent Technologies/Bell Labs. (United States)


Published in SPIE Proceedings Vol. 3665:
15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98
Uwe F. W. Behringer, Editor(s)

© SPIE. Terms of Use
Back to Top