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Proceedings Paper

Overview of SCALPEL mask technology
Author(s): Gregory R. Bogart; Anthony E. Novembre; Avi Kornblit; Milton L. Peabody Jr.; Reginald C. Farrow; Myrtle I. Blakey; Richard J. Kasica; James Alexander Liddle; Thomas E. Saunders; Chester S. Knurek
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Paper Abstract

Scattering with angular limitation projection electron beam lithography is a true 4X reduction technology that capitalizes on high resolution capabilities from electron beam exposure and high throughput capability from projection.

Paper Details

Date Published: 23 April 1999
PDF: 2 pages
Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); doi: 10.1117/12.346223
Show Author Affiliations
Gregory R. Bogart, Lucent Technologies/Bell Labs. (United States)
Anthony E. Novembre, Lucent Technologies/Bell Labs. (United States)
Avi Kornblit, Lucent Technologies/Bell Labs. (United States)
Milton L. Peabody Jr., Lucent Technologies/Bell Labs. (United States)
Reginald C. Farrow, Lucent Technologies/Bell Labs. (United States)
Myrtle I. Blakey, Lucent Technologies/Bell Labs. (United States)
Richard J. Kasica, Lucent Technologies/Bell Labs. (United States)
James Alexander Liddle, Lucent Technologies/Bell Labs. (United States)
Thomas E. Saunders, Lucent Technologies/Bell Labs. (United States)
Chester S. Knurek, Lucent Technologies/Bell Labs. (United States)


Published in SPIE Proceedings Vol. 3665:
15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98
Uwe F. W. Behringer, Editor(s)

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