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Proceedings Paper

Investigation of lithography performance using multipass gray (MPG) with MEBES 5000
Author(s): Robert L. Dean; David W. Alexander; Jan M. Chabala; Thomas P. Coleman; Caryn Hartglass; Maiying Lu; Charles A. Sauer; Suzanne Weaver
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Paper Abstract

Leading edge technologies require continually shrinking design grids due to the demands of decreasing minimum feature size and higher resolution. Using conventional raster-scanned exposure tools to place these patterns on photomasks result in longer write times, because linear decreases in address result in exponential increases in write time. This phenomenon can be compensated for by changes in writing strategies. Multipass gray is one method of drastically improving throughput at small addresses while retaining lithographic quality.

Paper Details

Date Published: 23 April 1999
PDF: 13 pages
Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); doi: 10.1117/12.346222
Show Author Affiliations
Robert L. Dean, Etec Systems, Inc. (United States)
David W. Alexander, Etec Systems, Inc. (United States)
Jan M. Chabala, Etec Systems, Inc. (United States)
Thomas P. Coleman, Etec Systems, Inc. (France)
Caryn Hartglass, Etec Systems, Inc. (United States)
Maiying Lu, Etec Systems, Inc. (United States)
Charles A. Sauer, Etec Systems, Inc. (United States)
Suzanne Weaver, Etec Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 3665:
15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98
Uwe F. W. Behringer, Editor(s)

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