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Proceedings Paper

Ion projection lithography for IC manufacturing
Author(s): Albrecht Ehrmann; Rainer Kaesmaier; Hans Loeschner
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Paper Abstract

Since 1997, a MEDEA project funded by European governments has started which aims to proof the feasibility of ion projection lithography for IC production. An ion 4x reduction stepper is built within the project. The system consists of a multicusp ion source producing He ions, electrostatic lens electrodes, the mask unit, an in-situ beam adjustment unit, an off-axis wafer alignment system and a wafer stage. Before the tool is built, results about ion source capabilities and stochastic space charge have to be obtained. In parallel, a stencil mask technology fulfilling the requirements for the use in the ion projection tool is development.

Paper Details

Date Published: 23 April 1999
PDF: 7 pages
Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); doi: 10.1117/12.346207
Show Author Affiliations
Albrecht Ehrmann, Siemens AG (Germany)
Rainer Kaesmaier, Siemens AG (Germany)
Hans Loeschner, Ion Microfabrications Systems (Austria)


Published in SPIE Proceedings Vol. 3665:
15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98
Uwe F. W. Behringer, Editor(s)

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