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Proceedings Paper

Epitaxial oxide thin films: the new frontier
Author(s): T. Venkatesan
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Paper Abstract

The last decade has set the stage for the emergence of epitaxial metal-oxide films as one of the leading Optoelectronic material system of the future. This scenario was primarily stimulated by the advent of high temperature superconductors, a multi-component oxide, but more recently the resurgence of interest in doped oxide thin films has led to renewed interest in epitaxial oxide films in which a number of functionalities of importance to Optoelectronics have been seen. In this article we will make a brief sketch of the status of this technology.

Paper Details

Date Published: 2 January 1998
PDF: 10 pages
Proc. SPIE 3211, International Conference on Fiber Optics and Photonics: Selected Papers from Photonics India '96, (2 January 1998); doi: 10.1117/12.345524
Show Author Affiliations
T. Venkatesan, Univ. of Maryland/College Park (United States)


Published in SPIE Proceedings Vol. 3211:
International Conference on Fiber Optics and Photonics: Selected Papers from Photonics India '96
J. P. Raina; P. R. Vaya, Editor(s)

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