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Proceedings Paper

Ultraviolet laser damage and optical properties of thin films deposited by reactive-rf-magnetron sputtering (Abstract Only)
Author(s): Kunio Yoshida; Takeshi Kamiya; Noriaki Tochio; Kanyoshi Ochi; Schukichi Kaku; Tomosumi Kamimura; Hidetsugu Yoshida; Tsuyoshi Okamoto
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Paper Abstract

Optical coatings deposited by conventional evaporation processes have a number of shortcomings including weak adhesion which depends upon the subsurface condition of substrate and the change of spectral characteristics in the relative humidity. Thin films deposited by reactive-rf- magnetron sputtering improve these problems. Laser-induced damage thresholds at 355nm, measured by 1-on-1 and R-on-1 methods, of substrate and single high index zirconia, hafnia and aluminum oxide, and low-index silicon dioxide coated by magnetron sputtering, are reported.

Paper Details

Date Published: 7 April 1999
PDF: 1 pages
Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, (7 April 1999); doi: 10.1117/12.344459
Show Author Affiliations
Kunio Yoshida, Osaka Institute of Technology (Japan)
Takeshi Kamiya, Osaka Institute of Technology (Japan)
Noriaki Tochio, Osaka Institute of Technology (Japan)
Kanyoshi Ochi, Osaka Institute of Technology (Japan)
Schukichi Kaku, Osaka Institute of Technology (Japan)
Tomosumi Kamimura, Osaka Univ. (Japan)
Hidetsugu Yoshida, Osaka Univ. (Japan)
Tsuyoshi Okamoto, Okamoto Optics Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 3578:
Laser-Induced Damage in Optical Materials: 1998
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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