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Proceedings Paper

Coated optics for DUV excimer laser applications (Abstract Only)
Author(s): Jens Ullmann; Michael Mertin; Hans Lauth; Helmut Bernitzki; Klaus R. Mann; Detlev Ristau; Winfried Arens; Roland Thielsch; Norbert Kaiser
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Paper Abstract

Recent developments of DUV-excimer laser applications have gained in demands for radiation resistant coated components at interesting wavelengths. To meet the requirements of long term reliability and high pulse number throughput a superior performance of the optical components with lowest absorption and scattering losses is necessary. Within the framework of the German Joint Research Project "OPUS II" efforts are made to investigate the optical properties, the radiation resistance, and long term stability of single layers and layer systems of interest in the DUV. The evaluation of optical coatings and coating systems (AR and H R) on different substrate materials was carried out by scattering experiments, atomic force microscopy, infrared spectroscopy, calorimetric absorption measurements, determination of laser induced damage threshold (1-on-i, 1 000-on-i) and scratch tests. Additionally from spectrophotometric measurements the optical behaviour of the films was examined.

Paper Details

Date Published: 7 April 1999
PDF: 1 pages
Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, (7 April 1999); doi: 10.1117/12.344440
Show Author Affiliations
Jens Ullmann, Carl Zeiss (Germany)
Michael Mertin, Carl Zeiss (Germany)
Hans Lauth, JENOPTIK GmbH (Germany)
Helmut Bernitzki, JENOPTIK GmbH (Germany)
Klaus R. Mann, Laser-Lab. Goettingen e.V. (Germany)
Detlev Ristau, Laser Zentrum Hannover e.V. (Germany)
Winfried Arens, Laser Zentrum Hannover e.V. (Germany)
Roland Thielsch, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Norbert Kaiser, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 3578:
Laser-Induced Damage in Optical Materials: 1998
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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