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Proceedings Paper

DUV laser light sources (Abstract Only)
Author(s): Sergei V. Govorkov; Robert Willard
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Paper Abstract

High power laser sources of deep UV radiation play an important role in numerous applications such as microlithography, micromachining and material modification. Usefulness of deep UV lasers for each specific application arises from their unique characteristics, most importantly wavelength, temporal and spatial coherence and intensity distribution of the beam. Recent progress in the areas of DUV optical materials, laser resonators and electronics made possible dramatic improvements in power levels, brightness and intensity uniformity at these extremely short wavelengths, combined with long term stability and reliability. We report on recent advances in development of high power excimer lasers at the wavelengths of 248 nm, 1 93 nm and 1 57 nm for applications requiring high spectral brightness, such as microlithography, and high spatial and temporal coherence, such as writing of fiber Bragg gratings. We also present new data on high power all-solid-state laser sources of 266 nm, 213 nm and tunable UV radiation which are becoming a real alternative to excimer lasers in some DUV applications. We discuss impact of the long-term degradation of optical elements on the performance, reliability and running costs of recently developed DUV lasers

Paper Details

Date Published: 7 April 1999
PDF: 2 pages
Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, (7 April 1999); doi: 10.1117/12.344437
Show Author Affiliations
Sergei V. Govorkov, Lambda Physik, Inc. (United States)
Robert Willard, Lambda Physik, Inc. (United States)


Published in SPIE Proceedings Vol. 3578:
Laser-Induced Damage in Optical Materials: 1998
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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