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Proceedings Paper

1-kHz 5-W ArF excimer laser for microlithography with highly narrow 0.7-pm bandwidth and issues on durability related to optical damage
Author(s): Tatsuo Enami; Takeshi Ohta; Hirokazu Tanaka; Hirokazu Kubo; Toru Suzuki; Fumika Sunaka; Katsutomo Terashima; Akira Sumitani; Youichi Kawasa; Osamu Wakabayashi; Hakaru Mizoguchi
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Paper Abstract

We present the result of billion level durability test in the newest model of ArF excimer laser, KLES-G5A, for microlithography and durability issues relate to optical damage. The developed ArF laser achieves 5 W of output power with integrated energy stability less than +/- 0.3 percent at 1 kHz repetition rate. The spectral characteristic by FWHM of the deconvolved spectrum is less than 0.7 pm and the 95 percent energy of the total energy is within 2.0 pm band, which is designed to be suitable for partially achromatized refractive projection optics. Durability test of 1 billion pulses has already finished, and we have observed very slight changes in the performance. Prior to the durability test, irradiation examinations have been done. It demonstrates that CaF2 material has superior stability to SiO2 even as the high fluence DUV optical parts of line-narrowed ArF laser.

Paper Details

Date Published: 7 April 1999
PDF: 12 pages
Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, (7 April 1999); doi: 10.1117/12.344436
Show Author Affiliations
Tatsuo Enami, Komatsu Ltd. (Japan)
Takeshi Ohta, Komatsu Ltd. (Japan)
Hirokazu Tanaka, Komatsu Ltd. (Japan)
Hirokazu Kubo, Komatsu Ltd. (Japan)
Toru Suzuki, Komatsu Ltd. (Japan)
Fumika Sunaka, Komatsu Ltd. (Japan)
Katsutomo Terashima, Komatsu Ltd. (Japan)
Akira Sumitani, Komatsu Ltd. (Japan)
Youichi Kawasa, Komatsu Ltd. (Japan)
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Hakaru Mizoguchi, Komatsu Ltd. (Japan)


Published in SPIE Proceedings Vol. 3578:
Laser-Induced Damage in Optical Materials: 1998
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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