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Proceedings Paper

Defect characterization on superpolished fused silica surfaces polished for high-power-laser applications at 355 nm (Abstract Only)
Author(s): Lynn Matthew Sheehan; Zhouling Wu
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Paper Abstract

Laser damage threshold of super-polished fused silica at 355-nm is believed to be limited by localized defects associated with surface/substrate damage and contamination caused by the polishing process. Characterization of both the defects and their correlation with laser damage present a technical challenge: most of the existing characterization methods do not directly address absorption and thermo- mechanical response issues relevant to laser damage. In this work a dark-field photothermal microscopy (DPTM) with micron-level resolution is used for localization and identification of damage precursors for various fused silica surfaces. The experimental system uses the multiple UV lines from an Argon-ion laser. The samples studied are witness fused silica samples from various polishing vendors. In addition to DPTM, some of the samples are also studied using high-resolution optical microscopy and total internal reflection microscopy. The characterization result are then compared with laser damage testing data at 355-nm with a 7.5-ns pulse width. It is shown that while the DPTM data ca be correlated between damaged sites and DPTM defects is not obvious.

Paper Details

Date Published: 7 April 1999
PDF: 1 pages
Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, (7 April 1999); doi: 10.1117/12.344418
Show Author Affiliations
Lynn Matthew Sheehan, Lawrence Livermore National Lab. (Ireland)
Zhouling Wu, Lawrence Livermore National Lab. (United States)

Published in SPIE Proceedings Vol. 3578:
Laser-Induced Damage in Optical Materials: 1998
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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