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Proceedings Paper

Improvement of laser-induced surface damage in UV optics by ion beam etching (CsLiB6O10 and fused silica)
Author(s): Tomosumi Kamimura; Kazuhito Nakai; Yusuke Mori; Takatomo Sasaki; Hidetsugu Yoshida; Masahiro Nakatuka; Mitsuhiro Tanaka; S. Toda; M. Tanaka; Kunio Yoshida
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Paper Abstract

The laser-damage resistance of CLBO and fused silica surfaces was successfully improved after removing polishing compound by ion beam etching. The polishing compound embedded in the CLBO and fused silica surfaces was to a depth of less than 100 nm. We were able to remove polishing compound without degrading the surface condition when the applied ion beam voltage was less than 200 V. After surface etching, the effects of polishing compound removal on surface damage were characterized for the surface laser- induced damage threshold at 355 nm and surface lifetime at 266 nm as a function of etching depth. In the fused silica surface, we found improvement of the surface LIDT up to 15 J/cm2 as compared with that of the as-polished surface of 7.5 J/cm2. For the irradiation of a 266 nm high- intensity and high-repetition laser light, the exit surface lifetime of CLBO and fused silica could be more doubled compared with that of the as-polished surface.

Paper Details

Date Published: 7 April 1999
PDF: 7 pages
Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, (7 April 1999); doi: 10.1117/12.344405
Show Author Affiliations
Tomosumi Kamimura, Osaka Univ. (Japan)
Kazuhito Nakai, Osaka Univ. (Japan)
Yusuke Mori, Osaka Univ. (Japan)
Takatomo Sasaki, Osaka Univ. (Japan)
Hidetsugu Yoshida, Osaka Univ. (Japan)
Masahiro Nakatuka, Osaka Univ. (Japan)
Mitsuhiro Tanaka, Kogakugiken Co., Ltd. (Japan)
S. Toda, Kogakugiken Co., Ltd. (Japan)
M. Tanaka, Kogakugiken Co., Ltd. (Japan)
Kunio Yoshida, Osaka Institute of Technology (Japan)

Published in SPIE Proceedings Vol. 3578:
Laser-Induced Damage in Optical Materials: 1998
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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