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Proceedings Paper

Current status of radiation resistance of dielectric mirrors in the DUV
Author(s): Helmut Bernitzki; Hans Lauth; Roland Thielsch; Holger Blaschke; Norbert Kaiser; Klaus R. Mann
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Paper Abstract

Dielectric mirrors are key optical components in ArF excimer laser based devices for applications in DUV photolithography as well as in material processing. In all these applications different requirements of laser radiation resistance have to be met in relation to fluence, repetition rate and pulse number lifetime. Investigations have been performed into the radiation resistance of dielectric mirrors consisting of fluorides and oxides with emphasis to the properties of bending point mirrors used in beam delivery systems of wafer steppers. Problems and limitations for the improvements of the laser-induced-damage-thresholds of the coatings are discussed.

Paper Details

Date Published: 7 April 1999
PDF: 12 pages
Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, (7 April 1999); doi: 10.1117/12.344386
Show Author Affiliations
Helmut Bernitzki, JENOPTIK GmbH (Germany)
Hans Lauth, JENOPTIK GmbH (Germany)
Roland Thielsch, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Holger Blaschke, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Norbert Kaiser, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Klaus R. Mann, Laser-Lab. Goettingen e.V. (Germany)


Published in SPIE Proceedings Vol. 3578:
Laser-Induced Damage in Optical Materials: 1998
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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