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Proceedings Paper

Low-voltage drive electro-optic Pb(Zr,Ti)O3 waveguide devices fabricated by solid-phase epitaxy
Author(s): Keiichi Nashimoto; Shigetoshi Nakamura; Hiroaki Moriyama; Masao Watanabe; Eisuke Osakabe; Takashi Morikawa
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Paper Abstract

Pb(Zr,Ti)O3 (PZT) thin film optical waveguides were grown on Nb-doped SrTiO3(100) substrates by solid-phase epitaxy to fabricate an electrode/waveguide/semiconductor structure. The substrates were spin-coated with methoxyethoxide precursor solutions and preannealed to form amorphous thin films followed by the solid-phase epitaxial crystallization of the thin films above 650 degrees Celsius. The grown epitaxial PZT waveguides had a single perovskite phase and a single (001) orientation. The propagation loss was reduced to 1.7 dB/cm by introducing an epitaxial buffer layer between the PZT waveguide and the Nb-doped SrTiO3 substrate. An electro- optic beam deflector was fabricated by sputtering an ITO prism electrode on the surface of the waveguide. Efficient laser beam deflection larger than 10 mrad was observed by applying 5 V between the prism electrode and the substrate. An index change higher than 0.001 at 5 V and an effective electro-optic coefficient larger than 40 pm/V were estimated from the deflection characteristic. For integrating the electro-optic PZT waveguide devices with passive waveguide components, channel waveguides and waveguide lenses were also fabricated in the PZT waveguides using a simple wet-etching process. These achievements suggest the realization of variety of low- voltage drive integrated waveguide devices including matrix switches as well as the deflectors.

Paper Details

Date Published: 26 March 1999
PDF: 9 pages
Proc. SPIE 3620, Integrated Optics Devices III, (26 March 1999); doi: 10.1117/12.343724
Show Author Affiliations
Keiichi Nashimoto, Fuji Xerox Co., Ltd. (United States)
Shigetoshi Nakamura, Fuji Xerox Co., Ltd. (Japan)
Hiroaki Moriyama, Fuji Xerox Co., Ltd. (Japan)
Masao Watanabe, Fuji Xerox Co., Ltd. (Japan)
Eisuke Osakabe, Fuji Xerox Co., Ltd. (Japan)
Takashi Morikawa, Fuji Xerox Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 3620:
Integrated Optics Devices III
Giancarlo C. Righini; S. Iraj Najafi, Editor(s)

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