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Proceedings Paper

Roughness characterization of ultrasmooth surfaces using common-path interferometry
Author(s): Baishi Wang; S. P. Marchese-Ragona; Thomas C. Bristow
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Paper Abstract

The spatial frequency response, height sensitivity and system noise of a scanning common-path interferometer have been studied. The impulse response function and the frequency transfer function of the system are obtained analytically using Fresnel diffraction integral. Experimental results are also given. The results show that the system covers a broad spatial frequency range from 2 X 10-5/micrometer to 3/micrometer. The height sensitivity of the system is better than 0.01 angstrom. System stationary noise less than 0.1 angstrom RMS is achievable without additional noise reduction post-process. Measurement of an ultra-smooth silicon substrate with a sub-angstrom roughness is successfully demonstrated. Measurement of a smooth glass substrate is also shown.

Paper Details

Date Published: 29 March 1999
PDF: 7 pages
Proc. SPIE 3619, Surface Characterization for Computer Disks, Wafers, and Flat Panel Displays, (29 March 1999); doi: 10.1117/12.343706
Show Author Affiliations
Baishi Wang, Chapman Instruments (United States)
S. P. Marchese-Ragona, Chapman Instruments (United States)
Thomas C. Bristow, Chapman Instruments (United States)


Published in SPIE Proceedings Vol. 3619:
Surface Characterization for Computer Disks, Wafers, and Flat Panel Displays
John C. Stover, Editor(s)

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