Share Email Print
cover

Proceedings Paper

SiGe-based dual-wavelength demultiplexers and polarization splitters
Author(s): Matthew R.T. Pearson; Paul E. Jessop; Doug M. Bruce; Jugnu Ojha; Stephen Kovacic
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The simulation and performance of dual-wavelength demultiplexers fabricated in SiGe are presented. The device design is a symmetric directional coupler optimized for 1.3/1.55 micrometer demultiplexing. Modeling results using the Beam Propagation Method are presented as a means of examining the fabrication tolerances and design considerations of the devices. Initially the duplexers were fabricated with a Si.97Ge.03 core using chemical etching, and displayed crosstalk of -19 dB and -15 dB in the 1.3 and 1.55 micrometer wavelength channels, respectively. This performance was enhanced by thermal tuning, resulting in isolation of -21 dB and -18 dB. The high degree of strain in pseudomorphic SiGe layers results in highly birefringent waveguides. This characteristic restricts effective duplexer operation to a single polarization, but suggests that the same devices can be modified to act as polarization splitters for a chosen wavelength. Modeling of the devices in this configuration is also presented. The simple device design used for demultiplexers and splitters was chosen to evaluate the potential for fabrication of SiGe-based optoelectronic devices using standard VLSI processing relying on the local oxidation of silicon (LOCOS). A second set of devices was successfully fabricated using LOCOS and effectively separated 1.15 and 1.3 micrometer wavelength signals. This performance is compared to similar devices that were wet-etched.

Paper Details

Date Published: 19 March 1999
PDF: 11 pages
Proc. SPIE 3630, Silicon-based Optoelectronics, (19 March 1999); doi: 10.1117/12.342799
Show Author Affiliations
Matthew R.T. Pearson, McMaster Univ. (Canada)
Paul E. Jessop, McMaster Univ. (Canada)
Doug M. Bruce, McMaster Univ. (Canada)
Jugnu Ojha, Nortel Networks (Canada)
Stephen Kovacic, Nortel Technology (Canada)


Published in SPIE Proceedings Vol. 3630:
Silicon-based Optoelectronics
Derek C. Houghton; Eugene A. Fitzgerald, Editor(s)

© SPIE. Terms of Use
Back to Top