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Proceedings Paper

Characterization of conductive probes for atomic force microscopy
Author(s): Thomas Trenkler; Thomas Hantschel; Wilfried Vandervorst; Louis Hellemans; Wilhelm Kulisch; Egbert Oesterschulze; Philippe Niedermann; T. Sulzbach
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Paper Abstract

The availability of very sharp, wear-proof, electrically conductive probes is one crucial issue for conductive AFM techniques such as SCM, SSRM and Nanopotentiometry. The purpose of this systematic study is to give an overview of the existing probes and to evaluate their performance for the electrical techniques with emphasis on applications on Si at high contact forces. The suitability of the characterized probes has been demonstrated by applying conductive AFM techniques to test structures and state-of- the-art semiconductor devices. Two classes of probes were examined geometrically and electrically: Si sensors with a conductive coating and integrated pyramidal tips made of metal or diamond. Structural information about the conductive materials was obtained by optical and electron microscopy as well as by AFM roughness measurements. Swift and non-destructive procedures to characterize the geometrical electrical properties of the probes prior to the actual AFm experiment have been developed. A number of analytical tools have been used to explain the observed electrical behavior of the tested probes.

Paper Details

Date Published: 10 March 1999
PDF: 12 pages
Proc. SPIE 3680, Design, Test, and Microfabrication of MEMS and MOEMS, (10 March 1999); doi: 10.1117/12.341191
Show Author Affiliations
Thomas Trenkler, IMEC (Belgium)
Thomas Hantschel, IMEC (Belgium)
Wilfried Vandervorst, IMEC and Katholieke Univ. Leuven (Belgium)
Louis Hellemans, Katholieke Univ. Leuven (Belgium)
Wilhelm Kulisch, Univ. of Kassel (Germany)
Egbert Oesterschulze, Univ. of Kassel (Germany)
Philippe Niedermann, CSEM (Switzerland)
T. Sulzbach, Nanosensors GmbH (Germany)

Published in SPIE Proceedings Vol. 3680:
Design, Test, and Microfabrication of MEMS and MOEMS
Bernard Courtois; Wolfgang Ehrfeld; Selden B. Crary; Wolfgang Ehrfeld; Hiroyuki Fujita; Jean Michel Karam; Karen W. Markus, Editor(s)

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