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Proceedings Paper

Fabrication of thin film resistors and silicon microstructures using a frequency-doubled Nd:YAG laser
Author(s): Alexander Wogersien; Stefan Dauer; Stephanus Buettgenbach
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Paper Abstract

A laser-assisted technology for the fabrication of micro electro mechanical system has been developed. This method allows micromachining of bulk silicon wafers and silicon membranes by using a Q-switched Nd:YAG-laser with optional frequency doubling. Moreover, thin gold film resistors can be patterned on passivated silicon and glass substrates. Because direct laser processing is a highly flexible and timesaving method it is well studied for rapid prototyping and small volume production. Combining laser micromachining with conventional photolithographic techniques new designs of microsensors and actuators can be achieved.

Paper Details

Date Published: 10 March 1999
PDF: 8 pages
Proc. SPIE 3680, Design, Test, and Microfabrication of MEMS and MOEMS, (10 March 1999); doi: 10.1117/12.341182
Show Author Affiliations
Alexander Wogersien, Technical Univ. of Braunschweig (Germany)
Stefan Dauer, Technical Univ. of Braunschweig (Germany)
Stephanus Buettgenbach, Technical Univ. of Braunschweig (Germany)

Published in SPIE Proceedings Vol. 3680:
Design, Test, and Microfabrication of MEMS and MOEMS
Bernard Courtois; Wolfgang Ehrfeld; Selden B. Crary; Wolfgang Ehrfeld; Hiroyuki Fujita; Jean Michel Karam; Karen W. Markus, Editor(s)

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