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Proceedings Paper

Preliminary results on the use of mirrors for LIGA process
Author(s): Stephan Megtert; Franz Josef Pantenburg; Sven Achenbach; Roland K. Kupka; Juergen Mohr; Marc Roulliay
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Paper Abstract

A double mirror system has been studied and realized for purposes of Deep x-ray Lithography/LIGA. Because structuring high aspect ratio resist ask for high photon flux to maintain exposure time compatible with industrial process, hard x-ray synchrotron radiation is necessary and its broadband spectrum is normally used. However one would need to shape this spectrum on both low and high-energy parts. The former may lead to resist surface overdoes and is treated by means of appropriate filters. The later is prejudicial at resist-metallic substrate interface where high-energy photons are preferentially absorbed giving rise to extra-dose even behind absorber patterns. This may result in microstructures adhesion break down for positive resist and incomplete dissolution for negative tone ones. A mirror set up in the upstream beam-line is a correct answer to prevent these effects. The association of filters and mirror gives an adjustable band-pass filter to fit almost exposure requirements in deep x-ray lithography. Preliminary result of such a system are presented concerning its band-pass filter character, flux performances and first comparative effects on resist microstructures.

Paper Details

Date Published: 10 March 1999
PDF: 7 pages
Proc. SPIE 3680, Design, Test, and Microfabrication of MEMS and MOEMS, (10 March 1999); doi: 10.1117/12.341158
Show Author Affiliations
Stephan Megtert, LURE/Univ. de Paris Sud (France)
Franz Josef Pantenburg, Forschungszentrum Karlsruhe (Germany)
Sven Achenbach, Forschungszentrum Karlsruhe (Germany)
Roland K. Kupka, LURE/Univ. de Paris Sud (France)
Juergen Mohr, Forschungszentrum Karlsruhe (Germany)
Marc Roulliay, LURE/Univ. de Paris Sud (France)


Published in SPIE Proceedings Vol. 3680:
Design, Test, and Microfabrication of MEMS and MOEMS
Bernard Courtois; Wolfgang Ehrfeld; Selden B. Crary; Wolfgang Ehrfeld; Hiroyuki Fujita; Jean Michel Karam; Karen W. Markus, Editor(s)

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