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Proceedings Paper

Modeling of a photolytically excited HF chemical laser based on a NF3/H2 gas mixture
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Paper Abstract

A numerical code has been developed to simulate the characteristics of HF chemical laser based on non-chain reaction pumped by a planar sliding discharge radiation. The model considers transport of VUV pump radiation through the nonlinear absorptive active medium containing NF3/H2/N2/Ar gas mixture coupled with chemical and lasing kinetics describing the temporal and spatial evolution of particle species concentration and intracavity lasing photons density. The relative importance of various kinetic processes is evaluated and a 3.2 J/l laser output specific energy is calculated along the laser axis.

Paper Details

Date Published: 22 December 1998
PDF: 7 pages
Proc. SPIE 3574, XII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (22 December 1998); doi: 10.1117/12.334500
Show Author Affiliations
Marc P. Sabonnadiere, Institut de Recherche sur les Phenomenes Hors Equilibre (France)
Vadim I. Tcheremiskine, Institut de Recherche sur les Phenomenes Hors Equilibre (Russia)
Marc L. Sentis, Institut de Recherche sur les Phenomenes Hors Equilibre (France)
L. D. Mikheev, P.N. Lebedev Physical Institute (Russia)
Philippe Ch. Delaporte, Institut de Recherche sur les Phenomenes Hors Equilibre (France)


Published in SPIE Proceedings Vol. 3574:
XII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference
Anatoly S. Boreisho; Gennady A. Baranov, Editor(s)

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