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Proceedings Paper

Implementation and performance of a femtosecond laser mask repair system in manufacturing
Author(s): Richard A. Haight; Dennis Hayden; Peter Longo; Timothy E. Neary; Alfred Wagner
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Paper Abstract

Current laser based tools for removing Cr defects are fundamentally limited due to the thermal nature of ablation carried out with nanosecond pulses. Conversely, ablation carried out with femtosecond pulses of light removes Cr in a non-thermal process. As a result, the problems of metal splatter, haze, reduced transmission and pitting of the underlying quartz common to nanosecond ablation are virtually nonexistent with femtosecond ablation of Cr. In this paper we describe a femtosecond pulsed laser mask repair system which is presently operating successfully in a manufacturing environment.

Paper Details

Date Published: 18 December 1998
PDF: 8 pages
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); doi: 10.1117/12.332872
Show Author Affiliations
Richard A. Haight, IBM Thomas J. Watson Research Ctr. (United States)
Dennis Hayden, IBM Microelectronics Div. (United States)
Peter Longo, IBM Thomas J. Watson Research Ctr. (United States)
Timothy E. Neary, IBM Microelectronics Div. (United States)
Alfred Wagner, IBM Thomas J. Watson Research Ctr. (United States)


Published in SPIE Proceedings Vol. 3546:
18th Annual BACUS Symposium on Photomask Technology and Management
Brian J. Grenon; Frank E. Abboud, Editor(s)

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