Share Email Print
cover

Proceedings Paper

Actinic detection of EUVL mask blank defects
Author(s): Seongtae Jeong; Mourad Idir; Lewis E. Johnson; Yun Lin; Phillip J. Batson; Richard Levesque; Patrick A. Kearney; Pei-yang Yan; Eric M. Gullikson; James H. Underwood; Jeffrey Bokor
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We report the design and initial experimental results of an actinic inspection system for extreme ultraviolet lithography mask blank defect detection. Initial bright-field and dark- field results demonstrate sensitivity to submicron size phase defects.

Paper Details

Date Published: 18 December 1998
PDF: 7 pages
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); doi: 10.1117/12.332865
Show Author Affiliations
Seongtae Jeong, Lawrence Berkeley National Lab. (United States)
Mourad Idir, Lawrence Berkeley National Lab. and Univ. de Paris-Sud (France)
Lewis E. Johnson, Lawrence Berkeley National Lab. (United States)
Yun Lin, Univ. of California/Berkeley (United States)
Phillip J. Batson, Lawrence Berkeley National Lab. (United States)
Richard Levesque, Lawrence Livermore National Lab. (United States)
Patrick A. Kearney, Lawrence Livermore National Lab. (United States)
Pei-yang Yan, Intel Corp. (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
James H. Underwood, Lawrence Berkeley National Lab. (United States)
Jeffrey Bokor, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 3546:
18th Annual BACUS Symposium on Photomask Technology and Management
Brian J. Grenon; Frank E. Abboud, Editor(s)

© SPIE. Terms of Use
Back to Top