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Proceedings Paper

Half-multiphase printing: a proposed throughput improvement on MEBES 4500
Author(s): Wayne P. Shen
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Paper Abstract

This paper proposes a simple writing method, named 'half multiphase printing,' to improve the throughput of the MEBES 4500 raster-scan photomask writer by 40 - 50% while maintaining the same edge accuracy. The concept is simple and easy to apply. It is expected to be a very useful writing mode, especially for those applications with 0.25 - 0.35 micrometer design rules where 0.04 - 0.08 micrometer design grids and PBS resist are still widely used throughout the industry.

Paper Details

Date Published: 18 December 1998
PDF: 3 pages
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); doi: 10.1117/12.332855
Show Author Affiliations
Wayne P. Shen, Hewlett-Packard Co. (United States)

Published in SPIE Proceedings Vol. 3546:
18th Annual BACUS Symposium on Photomask Technology and Management
Brian J. Grenon; Frank E. Abboud, Editor(s)

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