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Proceedings Paper

Gaps in mask technology with respect to the National Technology Roadmap for Semiconductors
Author(s): Wallace R. Carpenter; Kimberly Sadler; Thomas White
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Paper Abstract

There are ever increasing technical and business demands on the mask industry, resulting in increasing costs and cycle times. The support infrastructure continues to lack the ability to provide solutions to mask makers in a timely manner, due to its inability to recover its investment quickly. This further constraints the development resourcing necessary to stay on the Moore's Law Curve. At the same time, the mask industry has not provided a clearly focused set of demands on the equipment suppliers beyond the SIA Roadmap. This paper has taken the approach of collecting key mask metric technology requirements from the entire International SEMATECH mask community as a comparison to the SIA Roadmap requirements through to the 100 nm technology node. The results of that information identify gaps in mask-making technology by metric and process flow, prioritize the key issues, and offer potential solutions to these issues. Mask costs are addressed and challenged.

Paper Details

Date Published: 18 December 1998
PDF: 7 pages
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); doi: 10.1117/12.332843
Show Author Affiliations
Wallace R. Carpenter, International SEMATECH and IBM (United States)
Kimberly Sadler, International SEMATECH and Texas Instruments, Inc. (United States)
Thomas White, International SEMATECH and Advanced Micro Devices, Inc. (United States)

Published in SPIE Proceedings Vol. 3546:
18th Annual BACUS Symposium on Photomask Technology and Management
Brian J. Grenon; Frank E. Abboud, Editor(s)

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