Share Email Print

Proceedings Paper

Accuracy differences among photomask metrology tools and why they matter
Author(s): James E. Potzick
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A variety of different kinds of photomask critical dimension (CD) metrology tools are available today to help meet current and future metrology challenges. These tools are based on different operating principles, and have differing cost, throughput, footprint, etc. But how do their potential accuracies differ, and is this important? In this context the effects of tool resolution, the meaning of measurement accuracy and traceability, the role of standards, and how these fit into the measurement model and affect manufacturing profitability are discussed. These considerations can help in choosing the right tool for the measurement task at hand and in evaluating the measurement results.

Paper Details

Date Published: 18 December 1998
PDF: 9 pages
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); doi: 10.1117/12.332842
Show Author Affiliations
James E. Potzick, National Institute of Standards and Technolgy (United States)

Published in SPIE Proceedings Vol. 3546:
18th Annual BACUS Symposium on Photomask Technology and Management
Brian J. Grenon; Frank E. Abboud, Editor(s)

© SPIE. Terms of Use
Back to Top