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Proceedings Paper

Evaluation of the practical use of GHOST technique for various e-beam resists
Author(s): Byung-Cheol Cha; Jin-Min Kim; Byung Guk Kim; Seong-Woon Choi; Hee-Sun Yoon; Jung-Min Sohn
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Paper Abstract

In this paper we present results of the application of the GHOST technique to the practical use with 10 keV system. Three commercial e-beam resists which include ZEP7000, PBS, and EBR9 HS31 are selected for comparisons. The background dose equalization by the GHOST technique was found to be effective in reducing the proximity effect. It is generally assumed that exposure contrast degradation due to secondary exposure with largely defocused beam for the GHOST technique, especially at boundary between pattern pixel and nonpattern pixel, leads to poor CD uniformity. Thus, we examined CD uniformity variations as a function of with and without the GHOST technique for three e-beam resists .And we also reported the comparison of proximity effect correction quality for three resists by looking at CD linearity in order to investigate relationship between proximity effect and resist contrast.

Paper Details

Date Published: 18 December 1998
PDF: 8 pages
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); doi: 10.1117/12.332834
Show Author Affiliations
Byung-Cheol Cha, Samsung Electronics Co., Ltd. (South Korea)
Jin-Min Kim, Samsung Electronics Co., Ltd. (South Korea)
Byung Guk Kim, Samsung Electronics Co., Ltd. (South Korea)
Seong-Woon Choi, Samsung Electronics Co., Ltd. (South Korea)
Hee-Sun Yoon, Samsung Electronics Co., Ltd. (South Korea)
Jung-Min Sohn, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 3546:
18th Annual BACUS Symposium on Photomask Technology and Management
Brian J. Grenon; Frank E. Abboud, Editor(s)

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