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Proceedings Paper

Automated layout and phase assignment techniques for dark-field alternating PSM
Author(s): Andrew B. Kahng; Huijuan Wang; Alexander Zelikovsky
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Paper Abstract

We describe new, efficient algorithms for layout modification and phase assignment for dark field alternating-type phase- shifting masks in the single-exposure regime. We make the following contributions. First, we give optimal and fast algorithms to minimize the number of phase conflicts that must be removed to ensure 2-colorability of the conflict graph. These methods can potentially reduce runtime and/or improve solution quality, compared to previous approaches of Moniwa et al. and Ooi et al. Second, we suggest a new iterative 2- coloring and compaction approach that simultaneously optimizes layout and phase assignment. The approach iteratively performs the following steps: (1) compact the layout and find the conflict graph; (2) find the minimum set of edges whose deletion makes the conflict graph bipartite; and (3) add a new compaction constraint for each edge in this minimum set, such that the corresponding pair of features will no longer conflict. Third, we describe additional approaches to co- optimization of layout and phase assignment for alternating PSM. Preliminary computational experience appears promising.

Paper Details

Date Published: 18 December 1998
PDF: 10 pages
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); doi: 10.1117/12.332830
Show Author Affiliations
Andrew B. Kahng, Univ. of California/Los Angeles (United States)
Huijuan Wang, Univ. of California/Los Angeles (United States)
Alexander Zelikovsky, Univ. of California/Los Angeles (United States)

Published in SPIE Proceedings Vol. 3546:
18th Annual BACUS Symposium on Photomask Technology and Management
Brian J. Grenon; Frank E. Abboud, Editor(s)

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