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Proceedings Paper

Effects of material properties on patterning distortions of optical reticles
Author(s): Bassam Shamoun; Walter J. Trybula; Roxann L. Engelstad; Edward G. Lovell
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Paper Abstract

Bulk (or global) heating of photomasks due to e-beam energy deposition during patterning causes thermal expansion of the mask substrate and leads to pattern placement errors. Finite element calculations were performed to simulate the in-plane distortions (IPD) due to the single pass writing of a 6 in. X 6 in. optical reticle. Comparison studies were performed to identify the effects of material properties (such as thermal conductivity and the coefficient of thermal expansion) when pattering SiO2 and CaF2 substrates. Final IPD maps illustrate that thermal distortions of the CaF2 will need to be controlled in order to satisfy increasingly stringent error budgets.

Paper Details

Date Published: 18 December 1998
PDF: 7 pages
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); doi: 10.1117/12.332829
Show Author Affiliations
Bassam Shamoun, Etec Systems, Inc. (United States)
Walter J. Trybula, International SEMATECH (United States)
Roxann L. Engelstad, Univ. of Wisconsin/Madison (United States)
Edward G. Lovell, Univ. of Wisconsin/Madison (United States)

Published in SPIE Proceedings Vol. 3546:
18th Annual BACUS Symposium on Photomask Technology and Management
Brian J. Grenon; Frank E. Abboud, Editor(s)

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