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Proceedings Paper

Electron-beam lithography simulation for mask making: III. Effect of spot size, address grid, and raster writing strategies on lithography performance with PBS and ZEP-7000
Author(s): Chris A. Mack
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Paper Abstract

This paper examines, from a modeling perspective, the effects of spot size, data address and raster writing strategy on lithographic performance. Both PBS, the current U.S. standard for mask making, and ZEP 7000, a new, much higher contrast material, will be examined for their impact on lithographic quality. Simulation is used to demonstrate the differences between resists, writing strategies and their implementation.

Paper Details

Date Published: 18 December 1998
PDF: 13 pages
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); doi: 10.1117/12.332813
Show Author Affiliations
Chris A. Mack, FINLE Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 3546:
18th Annual BACUS Symposium on Photomask Technology and Management
Brian J. Grenon; Frank E. Abboud, Editor(s)

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