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Proceedings Paper

Fabrication and performance of etched multilayer x-ray optics
Author(s): Zhanshan Wang; Yueying Ma; Jianlin Cao; Xingdan Chen; Xiangdong Xu; Yilin Hong; Shaojun Fu
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Paper Abstract

We present the recent advances achieved in the Changchun Institute of Optics and Fine Mechanics, Chinese Academy of Science, in the field of the soft X-ray etched multilayer optics. In the present study, Mo and Si have been chosen as materials for the scattering layer and space layer soft X-ray multilayer, respectively. The fabrication of Mo/Si multilayer used by the magnetron sputtering, the patterned resist was obtained by optical holography, and the pattern of the resist was transferred into the multilayer by the ion beam etching. The several components based on soft X-ray etched multilayer were measured by grazing incidence X-ray reflectance measurements at (lambda) equals 0.154 nm (Cu-K(alpha )) using a conventional diffractometer.

Paper Details

Date Published: 11 December 1998
PDF: 6 pages
Proc. SPIE 3448, Crystal and Multilayer Optics, (11 December 1998); doi: 10.1117/12.332521
Show Author Affiliations
Zhanshan Wang, Changchun Institute of Optics and Fine Mechanics (China)
Yueying Ma, Changchun Institute of Optics and Fine Mechanics (China)
Jianlin Cao, Changchun Institute of Optics and Fine Mechanics (China)
Xingdan Chen, Changchun Institute of Optics and Fine Mechanics (China)
Xiangdong Xu, Univ. of Science and Technology of China (China)
Yilin Hong, Univ. of Science and Technology of China (China)
Shaojun Fu, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 3448:
Crystal and Multilayer Optics
Albert T. Macrander; Andreas K. Freund; Tetsuya Ishikawa; Dennis M. Mills, Editor(s)

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