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Proceedings Paper

General-purpose high-resolution double-channel-cut monochromator for use on the ChemMatCARS insertion-device beamline at the Advanced Photon Source
Author(s): Timothy J. Graber; Susan M. Mini; P. James Viccaro
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Paper Abstract

The high-brilliance radiation provided by third-generation synchrotron x-ray facilities such as the Advanced Photon Source has greatly enhanced the power of such chemical and materials research techniques as x-ray-absorption spectroscopy, surface scattering, small-angle x-ray scattering, and chemical crystallography. In order to take full advantage of these source properties, we propose the development of a general-purpose high-energy-resolution double-channel-cut monochromator based on a similar device developed for nuclear-resonant-scattering techniques by the Experimental Facilities Division at the APS. The instrumentation will be installed at the APS on the ChemMatCARS insertion-device beamline at sector 15. It will be used primarily for valence-specific static and time-resolved chemical-crystallography experiments as well as anomalous- scattering experiments planned for surface diffraction and small-angle/wide-angle x-ray scattering. Two channel-cut crystals placed in a dispersive (-n, +n, +n, -n) geometry provide a fixed-offset beam with an energy resolution (Delta) E/E approximately 10-5. Several sets of channel-cut-crystal pairs, designed to cover an energy range from 6 to 35 keV with a matching angular acceptance to the source, are used in conjunction with the beamline high- heat-load double-crystal monochromator.

Paper Details

Date Published: 11 December 1998
PDF: 10 pages
Proc. SPIE 3448, Crystal and Multilayer Optics, (11 December 1998); doi: 10.1117/12.332513
Show Author Affiliations
Timothy J. Graber, Univ. of Chicago (United States)
Susan M. Mini, Northern Illinois Univ. and Argonne National Lab. (United States)
P. James Viccaro, Univ. of Chicago (United States)


Published in SPIE Proceedings Vol. 3448:
Crystal and Multilayer Optics
Albert T. Macrander; Andreas K. Freund; Tetsuya Ishikawa; Dennis M. Mills, Editor(s)

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