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Proceedings Paper

Fabrication of an aspherical mirror for extreme-ultraviolet lithography (EUVL) optics
Author(s): Masahito Niibe; Atsushi Miyafuji; Hiroo Kinoshita; Takeo Watanabe; Shozo Inoue; Keiji Koterazawa
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Paper Abstract

We report a progress in the aspherization of precision of optical surface by deposition of graded-thickness films onto spherical substrate. As a deposition film, we examined single layer and multilayer film. Mo/Si multilayer had small stress and small surface roughness up to the total film thickness of 1 micrometers , and is suitable for the thin film to fabricate mirrors in the EUVL camera. We demonstrate an aspherical mirror fabrication using mask deposition technique. The result shows good agreement between the measured and desired thickness profiles.

Paper Details

Date Published: 13 November 1998
PDF: 8 pages
Proc. SPIE 3447, Advances in Mirror Technology for Synchrotron X-Ray and Laser Applications, (13 November 1998); doi: 10.1117/12.331127
Show Author Affiliations
Masahito Niibe, Himeji Institute of Technology (Japan)
Atsushi Miyafuji, Himeji Institute of Technology (Japan)
Hiroo Kinoshita, Himeji Institute of Technology (Japan)
Takeo Watanabe, Himeji Institute of Technology (Japan)
Shozo Inoue, Himeji Institute of Technology (Japan)
Keiji Koterazawa, Himeji Institute of Technology (Japan)


Published in SPIE Proceedings Vol. 3447:
Advances in Mirror Technology for Synchrotron X-Ray and Laser Applications
Ali M. Khounsary, Editor(s)

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