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Proceedings Paper

Design of a LIGA beamline using a multilayer-coated reflection mirror
Author(s): Hiroo Kinoshita; Yachiyo Kimpara; T. Uruga; Takeo Watanabe; Masahito Niibe; Yuriy Ya. Platonov; James L. Wood
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Paper Abstract

This paper describes the beamline optics for deep-etch x-ray lithography. In order to obtain a higher reflectivity than that provided by a mirror with a monolayer coating at photon energies of 4 to 6 keV, multilayer mirrors with a constant and graded d-spacing were developed. At an energy of 6 keV, a measured reflectivity of more than 80 percent and a bandwidth of 1 keV were obtained for a mirror with a Ni/C multilayer coating and a constant d-spacing. Moreover, it was found that, for energies form 4 to 6 keV, a multilayer mirror with a graded d-spacing provided a higher reflectivity and a wider bandwidth than a mirror with a Pt monolayer coating. A multilayer reflection mirror is a promising component of beamline optics for use in microfabrication and the structural analysis of materials.

Paper Details

Date Published: 13 November 1998
PDF: 10 pages
Proc. SPIE 3447, Advances in Mirror Technology for Synchrotron X-Ray and Laser Applications, (13 November 1998); doi: 10.1117/12.331117
Show Author Affiliations
Hiroo Kinoshita, Himeji Institute of Technology (Japan)
Yachiyo Kimpara, Avance Inc. (Japan)
T. Uruga, Japan Synchrotron Radiation Research Institute (Japan)
Takeo Watanabe, Himeji Institute of Technology (Japan)
Masahito Niibe, Himeji Institute of Technology (Japan)
Yuriy Ya. Platonov, Osmic Inc. (United States)
James L. Wood, Osmic Inc. (United States)


Published in SPIE Proceedings Vol. 3447:
Advances in Mirror Technology for Synchrotron X-Ray and Laser Applications
Ali M. Khounsary, Editor(s)

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