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Proceedings Paper

Detection of 60-deg phase defects on alternating PSMs
Author(s): Chris A. Spence; David Emery; Larry S. Zurbrick; Durai P. Prakash; X. Chang; Steve Khanna; Brent D. Leback; Eiji Tsujimoto; Greg P. Hughes; Baorui Yang
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Paper Abstract

In this paper we present results of an algorithm that has been developed which is sensitive to phase defects of 60 degrees on i-line alternating PSMs. This algorithm consists of microcode and software, which can be loaded into existing inspection hardware. The algorithm works in die-to-die inspection mode and uses both transmitted and reflected light images to maximize sensitivity. Isolated phase defects as well as phase defects close to chrome edges were inspected. In addition, the algorithm is able to detect missing and mis-aligned shifter edges. A programmed phase defect test plate was developed to characterize defect detection sensitivity. Detection of 60 degrees defects smaller than 0.75 micrometers has been demonstrated with this algorithm. Defect sensitivity characterization and actual production plate effect results are shown. Finally, recent results showing the application of the algorithm to the inspection of Deep-UV multiphase reticles using a shorter inspection wavelength are presented.

Paper Details

Date Published: 1 September 1998
PDF: 16 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328859
Show Author Affiliations
Chris A. Spence, Advanced Micro Devices, Inc. (United States)
David Emery, KLA-Tencor Corp. (United States)
Larry S. Zurbrick, KLA-Tencor Corp. (United States)
Durai P. Prakash, KLA-Tencor Corp. (United States)
X. Chang, KLA-Tencor Corp. (United States)
Steve Khanna, KLA-Tencor Corp. (United States)
Brent D. Leback, KLA-Tencor Corp. (United States)
Eiji Tsujimoto, KLA-Tencor Corp. (Japan)
Greg P. Hughes, DuPont RTC (United States)
Baorui Yang, DuPont RTC (United States)


Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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