Share Email Print

Proceedings Paper

High-performance photomask cleaning process using electrolyzed water
Author(s): Yoshikazu Nagamura; Hozumi Usui; Nobuyuki Yoshioka; H. Morimoto
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

A new photomask cleaning process using electrolyzed water was suggested in this work. This process using the cathode water with a small amount of ammonium hydroxide showed good efficiencies of removing particles from photomask surfaces. MoSiON surface was not so damaged in the alkaline cathode water compared with in APM. The rinsing process in the anode water eliminated the sulfuric acid residue on the surfaces of quartz substrates. Using electrolyzed water reduced the consumptions of the chemicals, the water and the energy.

Paper Details

Date Published: 1 September 1998
PDF: 10 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328853
Show Author Affiliations
Yoshikazu Nagamura, Mitsubishi Electric Corp. (Japan)
Hozumi Usui, Wacom Electric Co. (Japan)
Nobuyuki Yoshioka, Mitsubishi Electric Corp. (Japan)
H. Morimoto, Mitsubishi Electric Corp. (Japan)

Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

© SPIE. Terms of Use
Back to Top