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Proceedings Paper

Ion projection lithography
Author(s): John Melngailis; Hans Loschner; Gerhard Stengl; Ivan L. Berry; Alfred A. Mondelli; Gerhard Gross
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Paper Abstract

In spite of the comparatively modest level of effort devoted to ion projection lithography, the results obtained so far indicate that the technology is highly promising. Accordingly, a $36M program has been launched in Europe to develop a full field, IPL process tool.

Paper Details

Date Published: 1 September 1998
PDF: 16 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328849
Show Author Affiliations
John Melngailis, Univ. of Maryland/College Park (United States)
Hans Loschner, Ion Microfabrication Systems GmbH (United States)
Gerhard Stengl, Ion Microfabrication Systems GmbH (Austria)
Ivan L. Berry, Microelectronics Research Lab. (United States)
Alfred A. Mondelli, Science Applications International Corp. (United States)
Gerhard Gross, Siemens AG (Germany)


Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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