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Proceedings Paper

Present status and technical issues of x-ray lithography
Author(s): Kimiyoshi Deguchi; Jiro Nakamura; Kazuya Nakanishi; Tadahito Matsuda
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Paper Abstract

The past several years have seen many improvements in a wide range of lithographic components of x-ray lithography using synchrotron radiation, including compact SR sources, vertical steppers, x-ray mask, and resist materials, to overcome the low-throughput problem, to improve overlay accuracy, and to make SR lithography a viable and practical method. SR lithography has been used in the test fabrication of LSIs in 0.2- and 0.1- micrometers regions, and has demonstrated an ability to manufacture future LSIs. The infrastructure for widespread industrial use is now beginning to form.

Paper Details

Date Published: 1 September 1998
PDF: 9 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328845
Show Author Affiliations
Kimiyoshi Deguchi, NTT System Electronics Labs. (Japan)
Jiro Nakamura, NTT System Electronics Labs. (Japan)
Kazuya Nakanishi, NTT System Electronics Labs. (Japan)
Tadahito Matsuda, NTT System Electronics Labs. (Japan)


Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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