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Proceedings Paper

Modified particle detection method for reticle/mask particle detection system
Author(s): Yoshinori Nagai; Toyoki Kanzaki
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Paper Abstract

A false detect in light scattering particle detection system is mainly caused by scattering light from densely designed pattern. HORIBA has developed a new signal processing method for particle detection systems in order to reduce false detect. This method reduce the scattering light signals form densely designed pattern in particular. This paper describes the method and the test result.

Paper Details

Date Published: 1 September 1998
PDF: 3 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328840
Show Author Affiliations
Yoshinori Nagai, HORIBA Ltd. (Japan)
Toyoki Kanzaki, HORIBA Ltd. (Japan)

Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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