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Proceedings Paper

Printability of backside reticle defects
Author(s): William Waters Volk; James N. Wiley; James A. Reynolds
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Paper Abstract

A 6 inch by 6 inch by 0.250 inch test reticle was manufactured with contact arrays on the image side and arrays of opaque chrome defects on the backside. A focus exposure matrix was printed using a 5X i-line and a 4X DUV ASM stepper to determine the smallest backside defect that would print. A defect was considered printable if it left any visible mark on the resist. At i-line the isolated minimum printable backside defect (MPBD) was 60 micrometers and the clustered MPBD was a 10 micrometers defect in a 10 by 10 array with 40 micrometers centers. At DUV the isolated minimum printable backside defect was 30 micrometers and the clustered MPBD was a 5 micrometers defect in a 10 by 10 array with 20 micrometers centers. Printability was found to be inversely proportional to NA and sigma. For both clusters and isolated defects, printability appear to be a function of the total chrome area in the region. The smallest defects printed at the highest exposure.

Paper Details

Date Published: 1 September 1998
PDF: 7 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328839
Show Author Affiliations
William Waters Volk, KLA-Tencor Corp. (United States)
James N. Wiley, KLA-Tencor Corp. (United States)
James A. Reynolds, Reynolds Consulting (United States)


Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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