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Proceedings Paper

Use of line-width error detection for quality control in reticle fabrication
Author(s): Yair Eran; Gidon Gottlib; Gad Greenberg; Jeremy Zelenko
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Paper Abstract

As design rules in high-end photo-lithographic reticles become tighter, the monitoring of line-width variations becomes more vital in the quality control of advance reticle manufacturing processes. In this paper a new concept of operation is presented, for using an inspection tool in the monitoring of line-width variants for the purpose improving such quality control. The inspection tool use in this paper, is Orbot-Applied's RT8000ES Reticle Inspection tool, in which the newly developed Line Width Error Detector is embedded.

Paper Details

Date Published: 1 September 1998
PDF: 8 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328835
Show Author Affiliations
Yair Eran, Orbot-Applied Industries (Israel)
Gidon Gottlib, Orbot-Applied Industries (Israel)
Gad Greenberg, Orbot-Applied Industries (Israel)
Jeremy Zelenko, Orbot-Applied Industries (Israel)


Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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