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Proceedings Paper

Gray map reference pattern generator of a die-to-database mask inspection system for 256-Mb and 1-Gb DRAMs
Author(s): Hideo Tsuchiya; Ikunao Isomura; Tomohide Watanabe; Kyoji Yamashita
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Paper Abstract

This paper describes a reference data generation method applied to a newly developed photolithographic mask inspection system, the MC-2000, for 256 Mbit and 1 Gbit DRAMs. The MC-2000, which utilizes i-line wavelength optics, is designed to have a defect detection capability as fine as 0.2 micrometers . A new reference data generation method employing a gray map pattern is effective for system performance in terms of accuracy of the map pattern and speed of the map data handling. Notable features of the gray map pattern generation method are simple algorithm and ease of hardware implementation. Corner pattern rounding circuit, re-sizing circuit, and reference data calculation have been developed together and are described, too. The proposed method was evaluated and an example of the detection of 0.2 micrometers defect is reported.

Paper Details

Date Published: 1 September 1998
PDF: 8 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328834
Show Author Affiliations
Hideo Tsuchiya, Toshiba Corp. (Japan)
Ikunao Isomura, Toshiba Corp. (Japan)
Tomohide Watanabe, Toshiba Corp. (Japan)
Kyoji Yamashita, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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