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Proceedings Paper

Mask CD quality assurance specifications for 0.25-um devices with a practical lithography window
Author(s): Takehiko Gunji; Tetuya Kitagawa; Kunihiko Tsuboi
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Paper Abstract

Mask specification requirements in production have been extremely tightened for 0.35 micrometers and 0.25 micrometers devices. Mask critical dimension (CD) specifications and transmission error specs, which were hardly taken care of in the 0.5 micrometers device generations, are the most important ones because they will affect size of optical lithographic exposure-defocus (ED) window significantly. The conventional mask quality assurance methods such as 5 point CD measurements within a mask are no longer effective if one considers CD at stripe butting, CD after focused ion beam defect repair and optical transmissivity after such repair. More extensive assurance methods and specs for such matters are required based on actual ED window.

Paper Details

Date Published: 1 September 1998
PDF: 7 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328825
Show Author Affiliations
Takehiko Gunji, Sony Corp. (Japan)
Tetuya Kitagawa, Sony Corp. (Japan)
Kunihiko Tsuboi, Sony Corp. (Japan)


Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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