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Proceedings Paper

Development of a high-performance e-beam resist suitable for advanced mask fabrication
Author(s): Kazutaka Tamura; H. Niwa; S. Kanetsuki; M. Asano; S. Mitamura; Daichi Okuno; Masa-aki Kurihara; Naoya Hayashi
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Paper Abstract

We developed a new positive E-beam resist, 'ERB'-900 MX for fabrication of advanced masks for the next generation. 'ERB'-900 MX is a non-chemically amplified resist based on novolak and naphthoquinonediazide. A newly designed additive and modification of the novolak resin contributed to improvement of sensitivity and resolution. There are two types of 'ERB'-900 MX, 'ERB'-900 MX(alpha) and MX(beta) whose solvents are different. Most important feature of 'ERB'-900 MX is highly sensitive. Especially, 'ERB'-900 MX(beta) showed excellent sensitivity of 3.5 (mu) C/cm2 at 20 keV and 12 (mu) C/cm2 at 50 keV. Stability of 'ERB'-900 MX after EB exposure was quite good. No practical change in sensitivity was observed for 12 hours in air and in vacuum. CD linearity of 'ERB'-900 MX(alpha) was around 0.75 micrometers for isolated patterns. CD bias for dry-etch process of 'ERB'-900 MX(alpha) is around 0.1micrometers which is comparable to that of 'ERB'-900 M-1. We confirmed that 'ERB'-900 MX has excellent performance suitable for fabrication of advanced masks.

Paper Details

Date Published: 1 September 1998
PDF: 9 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328813
Show Author Affiliations
Kazutaka Tamura, Toray Industries, Inc. (Japan)
H. Niwa, Toray Industries, Inc. (Japan)
S. Kanetsuki, Toray Industries, Inc. (Japan)
M. Asano, Toray Industries, Inc. (Japan)
S. Mitamura, Dai Nippon Printing Co., Ltd. (Japan)
Daichi Okuno, Dai Nippon Printing Co., Ltd. (Japan)
Masa-aki Kurihara, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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