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Proceedings Paper

ICP quartz etch uniformity improvement for phase-shift mask fabrication
Author(s): Chris Constantine; L. Heckerd
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Paper Abstract

The Quartz etch improvement program is established to technically understand and ascertain the limits, hardware implications and process conditions associated with the etching of Quartz Photomasks. This study explores several process parameters as well as salient hardware changes and ultimately analyzes results by etching test Photomasks as well as a test structure closely emulating a Levenson-style Phase Shift Photomask.

Paper Details

Date Published: 1 September 1998
PDF: 8 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328810
Show Author Affiliations
Chris Constantine, Plasma-Therm, Inc. (United States)
L. Heckerd, Plasma-Therm, Inc. (United States)


Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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