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Proceedings Paper

Performance of the ALTA 3500 scanned-laser mask lithography system
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Paper Abstract

The ALTA 3500, an advanced scanned-laser mask lithography tool produced by Etec, was introduced to the marketplace in September 1997. The system architecture was described and an initial performance evaluation was presented. This system, based on the ALTA 3000, uses a new 33.3X, 0.8 NA final reduction lens to reduce the spot size to 0.27 micrometers FWHM, thereby affording improved resolution and pattern acuity on the mask. To take advantage of the improved resolution, a new anisotropic chrome etch process has been developed and introduced along with change from Olin 895i resist to TOK iP3600 resist. In this paper we will more extensively describe the performance of the ALTA 3500 and the performance of these new processes.

Paper Details

Date Published: 1 September 1998
PDF: 12 pages
Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328807
Show Author Affiliations
Peter D. Buck, Etec Systems, Inc. (United States)
Alex H. Buxbaum, Etec Systems, Inc. (United States)
Thomas P. Coleman, ETEC Systems, Inc. (France)
Long Tran, Etec Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 3412:
Photomask and X-Ray Mask Technology V
Naoaki Aizaki, Editor(s)

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